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Nanoimprint litho report now posted on Small Times website |
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Mar 09, 2007 at 02:58 PM |
My news report on nanoimprint litho from last week's SPIE Advanced Lithography event just posted on www.smalltimes.com. As is always the case with space/word count-constrained pieces, I had to leave out more of the story than actually ended up in it.
But I did want to share one additional quote (for now) from my notes.
Toward the end of my interview over Peet's coffee with Mark Melliar-Smith, John Doering, and Rob Hershey of Molecular Imprints, I asked Melliar-Smith to summarize why imprint litho should be adopted. Here's the fully caffeinated version of what he said.
"We think that, across the board, we have the best technology. It's a revolutionary technology but it's [also] evolutionary in terms of the infrastructure. It's got much better lithographic capability, it's got much lower cost, it's much easier for designers to use, it's got the potential for a huge cost reduction in dual damascene in the back end of line. It's a new technology, so we're not trying to screw out the last tenth of a percent after 50 years. You've got all of the beginning of the S curve to work on, rather than the end of the S curve, which is where the photon guys are today."
Better to be at the beginning of the S curve than closing in on the bitter end of it, I suppose.
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