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Enhanced nanoimprint process for advanced lithography applications
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S.V. Sreenivasan, Ian McMackin, Frank Xu, David Wang & Nick Stacey, Molecular Imprints, Inc., Austin, Texas, USA and Doug Resnick, Motorola Research Laboratories, Tempe, AZ, USA
ABSTRACT
This article is concerned with a novel step-and-repeat nano-replication technique based on low-viscosity UV-curable liquids. This leads to significantly lower process defects.Further, the low viscosity liquids allow for nanoscale in-situ alignment corrections in the liquid just prior to UV curing, leading to improvements in alignment capability.
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