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Characterisation of Porous Low Dielectric Constant Films by Ellipsometric Porosimetry
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MIKHAIL R. BAKLANOV & KONSTANTIN P. MOGILNIKOV, XPEQT, Tessenderlo, Belgium
ABSTRACT
Ellipsometric porosimetry (EP) is an effective method for characterisation of porosity, pore size distribution (PSD) and specific surface area in porous Low-K films. The films can be deposited on top of any smooth substrate. EP is a new modification of the adsorption porosimetry. In situ ellipsometry is used to determine the amount of adsorptive which adsorbed/condensed in the film. Change in refractive index is used to calculate of the quantity of adsorptive present in the film.
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