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Consistant copper control Print E-mail
Feb 04, 2005 at 03:00 PM
ImageProduct Briefing Outline: ECI Technology
has announced the launch of its "QUALI-LINE QLC-8500" system. The QLC-8500 is an online chemical monitoring system for electroless baths used in VLSI damascene Cobalt capping applications. In addition to the proven CVS and Titration techniques, the QLC-8500 adds Spectroscopy, Oxidation Reduction Potential (ORP), Particle Count and many other critical capabilities to analyze and control electroless deposition. Multiple orders have already been booked, according to the company.





Problem: Electroless processes use more chemical components than copper electroplating, and the corresponding solutions are inherently unstable. Effective chemical monitoring is therefore critical towards the success of electroless deposition. Solution: The QLC-8500's unique design allows samples to be analyzed by multiple techniques simultaneously, greatly speeding up the process. Its software scheduler enables sophisticated yet flexible control over timing, frequency, and sequence of analysis. Better than 3-5% accuracy and 2-4% repeatability on analyses of all non-metal components. It uses spectroscopy with proprietary algorithms to promptly report metal concentration with extremely high precision.

Applications: VLSI Damascene Cobalt Capping. Damascene Seed Layer Repair/Enhancement. Copper Interconnect (by Electroless Deposition). Nickel Plating for MEMS and PCB Applications. It also provides information on all key chemical components including cobalt, copper, tungstate, palladium, reducing/ complexing/buffering agents, pH adjuster and background ions.

Platform: The Quali-Line QLC-8500 expands from the functionalities of the industry-leading QLC-7000 Chemical Monitoring System for copper electroplating. In addition to the proven CVS and Titration techniques, the QLC-8500 adds Spectroscopy, Oxidation Reduction Potential (ORP), Particle Count and many other critical capabilities to analyze and control electroless deposition.

Availability: February 2005 onwards.
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