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Molecular contamination monitoring in 193nm ArF tools |
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Feb 04, 2005 at 04:00 PM |
Product Briefing Outline: Extraction has introduced what it claims is
the industry's first complete toolset for detecting and measuring
lithography molecular contamination at ultra low levels. Extraction's
new tools - the TMB-193 and the LithoScout - fully address the
industry's need for both continuous and periodic monitoring of
molecular contamination in 193nm environments.
Problem: The consensus emerged from the 2004 Technology Roadmap
Workshop, that continuous monitoring of the 193nm resist process
environment is needed to ensure size uniformity in critical device
features, while simple, cost-effective, and accurate ultra trace-level
gas analysis is needed to meet lithography tool lens warranty
requirements. In order to safeguard the sensitive photoresists and
reticles used in 193nm lithography, device makers must continuously
monitor lithography environments for all many molecular bases,
including ammonia and amines.
Solution: The TMB-193 is claimed to be the only monitor capable
of detecting and measuring most base contaminants of concern without
the need to be tuned to individual compounds, leaving users with no
blind spots when it comes to understanding the contamination challenge
in their tools and facilities.
Applications: 193nm lithography tools
Platform: Based around Extraction's TMB-150 monitor platform,
the TMB-193 uses patent pending VSO™ flow and pressure stability
technology to continuously measure molecular contamination using
chemiluminescence, a highly reliable, accurate and rugged detection
technology not found in competing monitors. As a companion tool to the
TMB-193, the LithoScout sampling and reporting system offers a fast,
precise and convenient means of collecting and reporting these required
measurements. It is the only packaged air and gas sampling system
specifically designed for simultaneously detecting low-level acid, base
and organic contamination in lithography applications.
Availability: December 2004 onwards
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Product Briefings 
