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KrF scanner with 25% higher productivity |
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Feb 04, 2005 at 05:00 PM |
 Product Briefing Outline: Nikon continues its focus on
high productivity lithography solutions with the introduction of the
NSRS208D, an advanced KrF scanner with 25% higher throughput and
extremely low cost of ownership. Customers can use the system for mass
production of 110 nm or smaller devices. The system combines a high NA
projection lens (0.82 NA) with a newly developed, high productivity
platform that enables dramatic improvements in alignment. Alignment
accuracy was reduced to 10 nm or less, a 33% improvement over Nikon's
previous generation KrF scanner.
Problem: KrF scanners are used for the majority of the advanced
scanner applications for 110 nm down to 65 nm. With the shift to IC's
for consumer applications, chip manufacturers require lithography tools
with extremely high productivity and lower cost of ownership.
Solution: To ensure tight profile and CD control across the
wafer, Nikon designed the projection lens with the lowest aberration
and flare levels in the industry. High quality materials and
proprietary manufacturing technology provide a virtually perfect lens.
In addition, the NSR-S208D includes detailed environment control
systems to ensure the lens quality is maintained over the life of the
product. Nikon lenses are recognized throughout the industry for their
high quality and durability.
Applications: Advanced scanner applications for 110
nm down to 65 nm.
Platform: The system combines a high NA projection lens (0.82
NA) (Projection magnification 1:4), designed for use with a KrF excimer
laser with a newly developed, high productivity platform that enables
dramatic improvements in alignment. Alignment accuracy was reduced to
10 nm or less, a 33% improvement over Nikon's previous generation KrF
scanner.
Availability: March 2005 onwards.
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Product Briefings 
