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Home arrow Lithography arrow Edition 33 arrow 33rd Edition: Tuned reticle enhancements optimized for process response
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33rd Edition: Tuned reticle enhancements optimized for process response Print E-mail
Apr 10, 2007 at 03:55 PM

By Terrence E. Zavecz, TEA Systems, Philadelphia, USA

ABSTRACT

The International Technology Roadmap for Semiconductors' history details the growing complexity of device design and the latest device-manufacturer's techniques for tuning their process for each new design generation.  In spite of the current desire to incorporate techniques termed 'Design for Manufacture' into manufacturing, simulations and the design cycle, they do little more than optimize feature quality for ideal exposure conditions while testing for shorts, opens and overlay problems over process variations.

33rd Edition: Tuned reticle enhancements optimized for process response
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