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Home arrow Lithography arrow News arrow Lithography arrow Nikon and Synopsys adds Nikon exposure tool data to OPC solution
Nikon and Synopsys adds Nikon exposure tool data to OPC solution Print E-mail
Sep 18, 2007 at 06:55 PM
ProteusNikon’s proprietary optical lithography exposure tool data is now available for the latest release of the Synopsys Proteus optical proximity correction (OPC) software, the company has announced as part as part of an ongoing collaboration.

 The newly developed interface allows Proteus modeling customers to automatically access Nikon's scanner information, including lithographic effects such as polarisation, flare, synchronisation, and various aberration data, especially relevant at the 45nm node.

Nikon exposure systems Proteus can be used with includes the NSR-S610C, NSR-S609B, and NSR-S308F.

Readers' comments
Comment by niekgo on 2007-09-18 19:27:11
Did you see the press release from Brion today?


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