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New filter for high-flow bulk gas applications |
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Feb 04, 2005 at 09:00 PM |
 Product Briefing Outline: Pall Corporation's Microelectronics
Group has extended support to the display and semiconductor markets
with a new PTFE-based filter for high-flow, high-purity, bulk gas
delivery systems. The new High-Flow "Emflon" Filters enable users to
shrink the footprint of their filter systems, resulting in lower
capital and operational costs.
Problem: Pall designed the High-Flow Emflon Filter for use in the
newest generations of display and semiconductor manufacturing
facilities, which have a need to filter bulk nitrogen and clean dry air
(CDA) at flow rates in excess of 1,700 normal cubic meters per hour
(Nm3/h)/1,000 standard cubic feet per minute (SCFM). These high flow
rates are required in the manufacture of large-area displays, such as
those produced by seventh- and eighth-generation display production
facilities. The high flow rates also are required in the latest
generation of semiconductor production facilities, which use 300 mm
wafer substrates.
Solution: High-Flow Emflon filter systems allow manufacturers to use
smaller filter housings, saving precious fab space. A customer will
realize an average savings of greater than 20 percent on system
installations and greater than 50 percent on system maintenance when
using the High-Flow Emflon filters, Pall claims.
Applications: 7& 8th generation display fabs & all 300mm facilities.
Platform: Based on Pall's patented "Ultipleat" technology, the new
Emflon filters offer flow rates of up to 6,500 Nm3/h (3,800 SCFM) for a
single 1,016-mm /(40-inch) cartridge and a removal rating of 0.003
micron. A single 1,016-mm High-Flow Emflon filter can replace a typical
filter system requiring up to 30 standard 254-mm (10-inch) filters.
Availability: December 2004 onwards.
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Product Briefings 
