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New Product: Cymer’s 90W XLR 600i laser designed for immersion and Double Patterning |
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Sep 13, 2007 at 04:00 PM |
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 Product Briefing Outline: Cymer has introduced the XLR 600i offering 90 watts of output power at the 193nm wavelength. The XLR 600i is the first 90W argon fluoride (ArF) laser light source designed to enable volume immersion and Double Patterning (DP) lithography at the 32nm node and beyond. The 6kHz XLR600i produces improved pulse energy stability, resulting in improved critical dimension (CD) control required for the most critical imaging layers at memory, logic and foundry chipmakers.
Problem: Lithography technology is facing a number of key challenges to achieve improved resolution. The leading issues are meeting shrinking CD budgets by improving process control and maintaining affordability, primarily through improvements in wafer productivity as Double Patterning in ‘dry’ and immersion modes increases costs. One critical factor for overall success is the precision, stability and operational efficiency of the laser light sources powering these tools to enable DP lithography for volume production at the 32nm node and beyond.
Solution: The XLR 600i relies on a Recirculating Ring architecture which replaces the conventional power amplifier stage. The system leverages the advantages of a new era of improved optical stability sources over conventional increases in pulse repetition rate, to achieve a step function reduction in operating cost even as it permits higher wafer throughputs with 90W. The Power Regenerative Amplifier (PRA) provides improved pulse energy stability, resulting in improved critical dimension control required for critical imaging layers at memory, logic and foundry chipmakers. Additionally, the system features Cymer’s Advanced Bandwidth Stabilization (ABS) technology, delivering improved bandwidth performance that is claimed to achieve predictable and repeatable wafer-level process control. The system also exhibits a 10X reduction in gas refill frequency through Gas Lifetime Extension (GLX) technology, thereby increasing the net laser availability for increased wafer production output, according to the company.
Applications: Immersion and double patterning lithography at the 32nm node and beyond.
Platform: The XLR, first delivered to the market in early 2007 with the 60W XLR 500i, is an optical evolution of the XLA product series, with more than 400 systems shipped to date. The XLR 600i extends the family forward to 90W to enable immersion and double patterning production.
Availability: End of 2007 or per customer requests.
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Product Briefings 
