|
ASML reaches new productivity milestone for i-line lithography tools |
|
|
|
Sep 13, 2007 at 12:21 PM |
|
 ASML has said that its TWINSCAN XT:400F i-Line scanner recently reached a new productivity record by processing 150 (300mm) wafers per hour for 24 hours, reaching a new record output of 3,596 wafers in a single day.
“Our i-Line machines are future-proof. Not only do they offer the highest industry throughput, they also provide the tightest overlay available for 45-nm processes in volume production,” said Bert Koek, General Manager of 300mm business at ASML. “Overlay in the back-end layers will be one of the critical success factors in coming years as memory chip makers move to 45nm immersion lithography.”
The XT:400F is listed by ASML as a tool capable of greater than 135wph using its fast twin stage and high-intensity 5.5-kW Hg lamp.
|
News 
