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Process transparent liquid chemical concentration system |
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Feb 04, 2005 at 10:00 PM |
 Product Briefing Outline: Jetalon Solutions, Inc., has
developed a dependable, cost effective, point-of-use system for
monitoring and controlling the concentrations of liquid chemicals. The
"CR-288" is fully compatible with all liquid chemical manufacturing
processes and is currently installed on Chemical-Mechanical
Planarization and Wafer Surface Preparation tools.
Problem: The lack of suitable sensors makes acquiring information such
as concentration and flow rate of liquid chemicals at their point of
use in semiconductor
processing tools difficult or impossible.
Solution: The CR-288 System utilizes miniaturized optical reflectivity
technology and delivers highly accurate chemical information in
fractions of a second. This real-time sensor is compact (2" x 2" x 3"),
has no moving parts and is process transparent. It is claimed to have
produced chemical source reductions of up to 58% in early testing.
Applications: Chemical-Mechanical Planarization and Wafer Surface
Preparation tools. Temp. Range 10 - 80 degrees Celsius Sensitivity 2e
-5 Index of Refraction, 0.01%. Response Time 10 milliseconds. Pressure
Range 0 - 50psi.
Platform: The CR-288 advanced sensor technology is based on optical
reflectivity and its digital electronics provides scalability and
convenient data interface options. Has wetted parts compatible
with ultrahigh urity and caustic chemicals.
Availability: October 2004 onwards.
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Product Briefings 
