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Tool Order: Rohm and Haas purchases first Gamma XPress system from SUSS MicroTec |
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Sep 13, 2007 at 11:08 AM |
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 Rohm and Haas Electronics Materials has purchased SUSS MicroTec’s new Gamma XPress coat/develop cluster system, the first company to buy the new system. The Gamma XPress will be used by Rohm and Haas Electronic Materials to develop, characterize and optimize photodielectrics and both thick and thin photoresists.
“Bringing leading edge technology like ‘InterVia’ photoresists and photodielectrics to market requires our development labs to work with next generation processing equipment,” says Mike Toben, Global R&D Director for Rohm and Haas Electronic Materials, Packaging and Finishing Technologies “Our goal in selecting a new coating cluster was finding a system with the combination of high throughput and state-of-the-art control, and we believe we have found that with the new Gamma XPress. The SUSS MicroTec tool will significantly enhance our R&D and customer modeling capabilities.”
The system is scheduled for installation in late 2007 at Rohm and Haas’ photoresist manufacturing site in Nigata, Japan.
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Lithography 
