Product Briefing Outline: Molecular Imprints' new " Imprio 250" nano-imprint system uses Step and Flash Imprint Lithography "S-FIL" technology. The Imprio 250 offers sub-50 nm half-pitch resolution, sub-10 nm alignment, as well as integrated magnification control, and delivers high resolution and precision alignment for customers seeking cost-effective lithography.

Solution: The fundamental concept of S-FIL involves placing a pre-patterned transparent mold, called a template, into liquid-contact with a low viscosity, imprint fluid, which fills the template pattern. This process, although simple, is able to exactly replicate the template pattern with near-perfect critical dimension control at sub-50 nm resolutions. Also, this room temperature, low pressure replication process adds negligible line edge roughness (< 1 nm) to the features. Since the low viscosity imprint fluid is comprised of low molecular weight monomers less than 1 nm in length, there appears to be no barrier to patterning nano-scale structures, thus making this system truly multigenerational and affordable.

Applications: Advanced lithography applications including silicon IC device and process prototyping and pre-production at the 65 nm node, 45 nm node, and beyond.

Platform: As the industry's most advanced imprint lithography tool, the Imprio 250 includes fully automated wafer (up to 300 mm) and template loading capability and a novel, in-liquid alignment and magnification control system for mix & match capability with photolithography.

Availability: February 2005 onwards.