Product Briefing Outline: Molecular
Imprints' new " Imprio 250" nano-imprint system uses Step and Flash
Imprint Lithography "S-FIL" technology. The Imprio 250 offers sub-50 nm
half-pitch resolution, sub-10 nm alignment, as well as integrated
magnification control, and delivers high resolution and precision
alignment for customers seeking cost-effective lithography.
Problem: At the 65 nm node and beyond,
photolithography equipment is becoming prohibitively complex and
expensive. Unlike state-of-the-art optical lithography tools, the
Imprio 250 uses a broadband mercury arc lamp to replicate sub-50 nm
features and does not require a deep-ultraviolet laser source and
projection optics. Furthermore, the product's S-FIL process exactly
replicates the imprint templates, thereby making complicated optical
proximity correction photomasks unnecessary. The Imprio 250 is proving
to be a formidable substitute for next generation lithography tools, at
a fraction of the price.
Solution: The fundamental concept of S-FIL involves placing a
pre-patterned transparent mold, called a template, into liquid-contact
with a low viscosity, imprint fluid, which fills the template pattern.
This process, although simple, is able to exactly replicate the
template pattern with near-perfect critical dimension control at sub-50
nm resolutions. Also, this room temperature, low pressure replication
process adds negligible line edge roughness (< 1 nm) to the
features. Since the low viscosity imprint fluid is comprised of low
molecular weight monomers less than 1 nm in length, there appears to be
no barrier to patterning nano-scale structures, thus making this system
truly multigenerational and affordable.
Applications: Advanced lithography applications including
silicon IC device and process prototyping and pre-production at the 65
nm node, 45 nm node, and beyond.
Platform: As the industry's most advanced imprint lithography
tool, the Imprio 250 includes fully automated wafer (up to 300 mm) and
template loading capability and a novel, in-liquid alignment and
magnification control system for mix & match capability with
photolithography.
Availability: February 2005 onwards.
Lithography 
