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Intel donates 200mm process line to Chinese University |
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Sep 10, 2007 at 09:54 AM |
As part of Intel Corporation's plans to build a chip-set 300mm front-end fab in China that it expects to come on stream in 2010, the company is donating a complete line of 200mm process equipment to the Dalian University of Technology and the Dalian Municipal Government. The donation will establish a Semiconductor Technology Institute for training purposes to assist Intel in recruiting the right graduates for the new fabrication facility.
"Local talent development is a key component to our fab network strategy," said Wee Theng Tan, Vice President of Corporate Affairs Group and President of Intel China. "We're partnering with the Dalian University of Technology and the Dalian Municipal Government to establish the Semiconductor Technology Institute and donating a 200 mm wafer process line for training purposes. In the future, this Semiconductor Technology Institute will foster world-class talent for the IT industry in China and around the globe."
Intel's investment in Fab 68 sets its total investment in China to close to US$4 billion.
Intel broke ground on Fab 68 in northeast China last week, which is expected to cost a total investment of $4 billion over several years.
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