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Karlsruhe Nano Micro Facility starts using Vistec VB6 electron beam lithography system |
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Aug 22, 2007 at 06:01 PM |
 The Forschungszentrum Karlsruhe has started using its new Electron Beam Lithography system Vistec VB6. The Vistec system will be used to research new application fields for nanotechnology and microsystems technologies, according to the research centre.
"The new Vistec system will be an important module in the overall "Karlsruhe Nano Micro Facility. We are extremely pleased with the support and timely manner in which the system was installed", said Dr. Herbert Hein, Forschungszentrum Karlsruhe.
"The high precision writing capability of the electron beam lithography system will allow the Forschungszentrum Karlsruhe to develop a range of new technologies and applications," explained Mike Butler, Vistec Product Manager for Gaussian Beam Systems.
The high performance VB6 system uses a 100kV column that enables nanolithography of <10nm.
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