Bernd Nikolaus, Olivier Semprez, Gerry Blumenstock, Palash Das, Cymer, Inc., San Diego, CA, USA

ABSTRACT 

While 248 nm KrF-excimer lasers have successfully enabled the sub-quarter micron technology, the semiconductor industry is preparing for the next step in optical lithography using 193 nm ArF lasers. Optics and toolmakers are facing new challenges at 193 nm that were hitherto not experienced at 248 nm. Some of these challenges are optical damage of 193 nm coatings and materials, and the necessity to use large calcium fluoride lenses. Cymer, as the leading supplier of 248 nm illumination source, is exploring new design concepts and aggressively shifting the standards of ArF lasers to match the performance, cost and lifetime requirements of next generation 193 nm exposure tools.