|
STARC adds Blaze DFM’s Halo product to 65nm design implementation |
|
|
|
Aug 03, 2007 at 03:38 PM |
 After a three-month evaluation period, Blaze DFM has been selected by the Semiconductor Technology Academic Research Center (STARC) to provide lithography simulation and analysis software that will be integrated into the STARCAD-CEL (Certified Engineering Linkage, one step ahead of DFM) reference design flow for 65nm designs.
"For many of our member companies, it is critical to be able to accurately predict the photolithographic printability of their most advanced designs," said Nobuyuki Nishiguchi, Vice President and General Manager of Development Dept.-1 at STARC. "The importance of accuracy cannot be over-stated when choosing a lithography analysis solution. Blaze Halo provides fast, accurate lithographic variability analysis while being extremely scalable and robust under numerous process settings, hotspot rule sets, and CPU configurations."
"STARC's membership includes all of the major semiconductor companies in Japan, so their endorsement of Halo is of great strategic significance," said Jacob Jacobsson, President and CEO at Blaze. "STARC identifies and qualifies new technologies for advanced silicon processes and, as part of their reference flow, Halo becomes the lithography analysis solution of choice for their members."
Halo is the second Blaze product that has been qualified by STARC.
|
News 
