"After nearly a decade of research and development in EUV source technologies, we are pleased to announce achievement of our 50 watt instantaneous power milestone on schedule last month and that we are on track to higher required levels of performance," said Bob Akins, co-founder and chief executive officer of Cymer. "Together with ASML, Cymer is committed to commercializing EUV source technology to ensure the availability of sub-32nm exposure tools."

"Cymer's commitment to commercializing EUV light source technology is evidenced by its significant advancements in laser produced plasma (LPP) technology," said Martin van den Brink, executive vice president of marketing and technology at ASML. "We are confident that Cymer will help us make production-worthy EUV lithography a reality, clearing the way for semiconductor manufacturers to image ever-smaller features on chips. The sources delivered to ASML have the potential to expose 100 wafers per hour, which is required for cost effective EUV chip manufacturing."

Cymer also disclosed a breakthrough in debris mitigation technology which will substantially extend the lifetime of the multi-layer-mirror (MLM) collector which will it claims will enable an economically viable cost of operation, a key component of the source system for production use.