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Tool Order: NAND flash customer receives first XT:1900i from ASML |
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Jul 23, 2007 at 04:44 PM |
 ASML has shipped its first TWINSCAN XT:1900i (NA of 1.35) immersion lithography tool believed to be to a major NAND flash memory manufacturer that will be used for volume production at the 56nm node and below the capability of imaging features down to 36.5nm. The company claims that multiple system orders for the new tool have been placed with many shipped before the end of this year. ASML announced the news during SEMICON West, last week.
"ASML's immersion technology meets the demanding requirements of the world's top IC makers, said Martin van den Brink, executive vice president marketing and technology at ASML. "The XT:1900i, the latest addition to our production-proven line of immersion tools, allows customers to extend their high-volume manufacturing capabilities to an unprecedented 36.5-nm resolution." The XT:1900i has the highest numerical aperture available NA of 1.35 and 4.6-nm single-machine overlay capability with a 131 wafers per hour throughput.
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