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Rohm and Haas Electronic Materials invests US$60 million in immersion litho tool set |
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Jun 26, 2007 at 04:24 PM |
 To remain competitive in the fast-paced world of lithography materials technology, Rohm and Haas Electronic Materials has said that it will invest US$60 million in leading-edge lithography equipment including ASML's latest immersion lithography tool, the TWINSCAN XT: 1900Gi, to support photoresist and anti-reflective coatings development.
"As a leading material supplier to the semiconductor industry, our ability to deliver advanced lithography materials is critical, especially as the industry moves down below the 45nm node," said Dr. Dominic Yang, business unit Director, Microelectronic Technologies. "This investment will not only enable deep technical partnerships with the front runners in the Memory, Foundry and Logic segments, but will bring to these customers high quality products manufactured and tested using the best tools in the industry."
The equipment investment also includes a 300mm coat/develop track system that is connected to the immersion tool as well as defect inspection and metrology tools, though the company did not state the suppliers of these systems.
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