|
CNT in Dresden to use e-beam system from Vistec for 32nm IC R&D |
|
|
|
Jun 15, 2007 at 01:42 PM |
 The Fraunhofer Center for Nanoelectronic Technologies (CNT) in Dresden, Germany expects to use Vistec's SB3050 electron-beam lithography system for fast prototyping, design evaluation and R&D for technologies down to 32nm, after full acceptance of the tool was achieved in April, 2007.
"Thanks to Electron Beam Direct Write's high degree of flexibility and its excellent resolution performance it is already possible to develop processes for emerging technology levels - today," noted Professor Peter Kuecher, CNT director. "The installed Vistec system will enable our partners to shorten time to market and allow early evaluation of innovative processes and technologies - an example of CNT's mission of ‘docking research into manufacturing.'"
Vistec SB3050 has an improved 50 kV electron-optical column that allows writing of 32nm-and-below structures.
|
News 
