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Rohm and Haas opens lithography R&D center in Korea |
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Jun 06, 2007 at 03:45 PM |
 Rohm and Haas Electronic Materials has officially opened its expanded lithography materials-focused R&D center in Chonan, Korea. The $30 million investment in the facility will be dedicated to advanced 193nm ArF photoresist and anti-reflecting coatings development.
"We are pleased to see our expansion plans proceeding quickly," said Dr. Hoe-Sik Chung, president of the Microelectronic Technologies for Rohm and Haas Electronic Materials Korea. "The acceleration of our research programs in Chonan begins here with this opening ceremony. Coupled with our manufacturing capabilities of advanced products, the growing strength of our R&D infrastructure makes us well-positioned to serve the semiconductor materials needs in this region."
"We deploy our technology resources to address local customer needs," said Dr. Peter Trefonas, director of Research and Development for Microelectronic Technologies. "Our customers in the region will benefit from the responsiveness and close contact with our technologists that the new Chonan R&D Center will provide."
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