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Aviza and Air Liquide extend work on precursor materials |
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May 22, 2007 at 05:34 PM |
 Aviza Technology and Air Liquide have agreed to extend the term of a joint development agreement (JDA) originally signed in April 2005 through to 2010. The JDA includes research into improvements in precursor materials used for advanced single wafer and batch deposition processes for dielectric and electrode applications.
"To date, Aviza has experienced quite a successful collaborative partnership with Air Liquide," said Helmuth Treichel, Vice President of Advanced Applications of Aviza Technology, Inc. "Both Aviza and Air Liquide have benefited from our ongoing JDA and we feel there is much more opportunity to expand and enhance our research and development efforts by working with industry experts, like Air Liquide in the materials arena."
As part of the JDA, Air Liquide's ‘ALOHA' organization will produce the chemicals and perform the associated analyses and characterizations via their Precursor Screening Program.
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