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KURT RONSE & LUC VAN DEN HOVE, IMEC, Leuven, Belgium

ABSTRACT

Resolution enhancement techniques for optical lithography have been investigated for many years. Pioneering work on phase shifting masks for optical lithography was reported in 1982 by M.D. Levenson, ref. [1], but the real boom of research on resolution enhancement techniques took place in the early 90s. Nevertheless, more than 8 years later, only very few of these techniques are being used in the production of integrated circuits. In this paper, the status of the various enhancement techniques is reviewed, their capabilities illustrated and their challenges discussed. In conclusion, an attempt is made to predict the insertion of these techniques in manufacturing.