|
New Product: VUV xenon lamp system from OSRAM offers new wafer surface cleaning methodologies |
|
|
|
May 10, 2007 at 02:03 PM |
 Product Briefing Outline: OSRAM has introduced a new xenon excimer lamp system called ‘XERADEX' that is claimed to yield four times the vacuum ultraviolet (VUV) radiation power of conventional excimer radiators in pulse mode. Applications include wafer surface treatment, ozone production, lacquer frosting, water purification, and many more. The quartz bulb functions as a dielectric barrier within a unique electrode system, which prevents the formation of an electric arc during the discharge phase.
Problem: Due to more complex surface structures and increasing packaging densities of electronics, demand for new cleaning methods is increasing in both semiconductor and flat panel display (FPD) industries.
Solution: The XERADEX® systems open new possibilities for innovative dry cleaning processes. At 166 kcal/mol (7.2 eV), the high photon energy of the radiation breaks even tenacious molecular bonds quickly and efficiently. The concurrent production of ozone and oxygen radicals accelerates cleaning and reduces process time considerably, according to the company. In particular, oxygen radicals O(1D), which are the major contributor to surface cleaning effects, are formed in large quantities by the XERADEX® technology. The UV/ozone cleaning mechanism enables processes like the removal of organics (e.g., photoresist from wafers and photo masks) and the activation of surfaces in semiconductor applications, often minimizing or eliminating the use of harsh chemical treatment steps.
Applications: Surface cleaning, ozone production, lacquer frosting, water purification.
Platform: Its 40 percent claimed efficiency eliminates the need for cooling of the lamp - the temperature of the radiator never exceeds 80°C (176°F) "cold radiation"; low temperature processing is possible.
Availability: April 2006 onwards.
|
Critical Components 