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SEMATECH gives $700k funding for novel double patterning resists |
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May 02, 2007 at 05:32 PM |
 International SEMATECH North has allocated $700,000 to fund research into novel photoresists for double patterning applications at the 32nm node and beyond. The work is being undertaken with the College of Nanoscale Science and Engineering ("CNSE") of the University at Albany and Columbia University.
"SEMATECH is pleased to expand the innovative and important research into immersion lithography being performed by Columbia University as part of the International SEMATECH North program at the New York State Center of Excellence in Nanoelectronics and Nanotechnology at Albany's College of Nanoscale Science and Engineering," stated SEMATECH President and CEO Michael R. Polcari. "The ability to tap into top-notch colleges and universities throughout New York to help drive fundamental knowledge and technological breakthroughs is a vital factor in SEMATECH's mission to prepare lithography for advanced nanoelectronics manufacturing."
ISMTN has already started a project with Columbia to develop high-index materials, and the expanded scope with double exposure materials now covers both of the most likely options of extending immersion lithography.
The new research into resists for double patterning is due to the need to reduce process cycle times, thus reducing costs as well as the technical issues surrounding exposure issues with double patterning.
$700,000 of additional funding has been provided by ISMTN to Columbia University that more than doubles the initial scope of the project.
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Lithography 
