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32nd Edition: Cost of ownership challenges in front-end thermal processes |
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May 01, 2007 at 04:45 PM |
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Alan Levine, Jasen Sanders, CA, USA ABSTRACT The use of new ultrapure poly silicon furnaceware has a dramatic impact on the cost of ownership for the entire LPCVD polysilicon process. Benefits are demonstrated in cost reduction and increased productivity. Further benefits are demonstrated for yield, which is quantified in cost of ownership as a change in scrap costs. Sensitivity analysis allows these results to be extrapolated to a wide range of situations.
32nd Edition: Cost of ownership challenges in front-end thermal processes
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