|
Veeco receives further funding from SEMATECH for EUV mask tools |
|
|
|
Apr 23, 2007 at 02:40 PM |
 SEMATECH has provided Veeco Instruments with a further $2.4 million in funding for the development of its Ion Beam Deposition Tool, which is being used in the fabrication of EUV mask blanks at the Albany R&D centre. Veeco has received approximately $19 million in funding for Ion Beam products and R&D programs, according to the company.
"As SEMATECH pushes aggressively to ready extreme ultraviolet lithography for advanced manufacturing, our ability to work with the statewide infrastructure of nanoelectronics-focused, world-class companies throughout New York is critical to our success," stated Michael R. Polcari, SEMATECH President and CEO. "This latest project with Veeco, in concert with the hundreds of New York companies we are working with, is serving to accelerate the research and development that is vital both to the future of EUV lithography and the global nanoelectronics industry."
"Veeco's ‘NEXUS' LDD Ion Beam Deposition System continues to demonstrate the ability to provide not just low defect density deposition, but also the precise control required for critical work such as EUV photomask deposition," stated Robert P. Oates, Executive Vice President, Veeco Process Equipment. "We are pleased to continue working on this important research with SEMATECH through its International SEMATECH North program at the New York State Center of Excellence in Nanoelectronics and Nanotechnology at Albany's College of Nanoscale Science and Engineering. We are also grateful to Governor Spitzer and the State of New York for the significant investments in university research and high technology commercialization."
Veeco has received approximately $19 million in funding for Ion Beam products and R&D programs, according to the company.
|
News 
