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Order Win: Invarium’s OPC technology selected by semiconductor OEM |
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Apr 16, 2007 at 02:43 PM |
 A leading U.S.-based semiconductor equipment manufacturer has selected Invarium's full-chip ‘DimensionPPC' technology for mask design and patterning process optimization. The OEM is expected to use DimensionPPC to enable rapid back-end-of-line (BEOL) integration on its test ICs at the 45 and 32nm nodes, the company said.
"Patterning is critical to continued innovation in the industry," said Ram Ramanujam, senior vice president, marketing and sales at Invarium. "Strong collaboration is needed between manufacturing and design to achieve optimal patterning performance at the widest process windows. This win reinforces Invarium's state-of-the-art solution for 45 and 32nm patterning. DimensionPPC overcomes the deficiencies in today's RET/OPC tools from mask through etch, providing a comprehensive patterning synthesis solution for advanced processes, and designed to minimize mask re-spins."
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