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Second U.S. patent issued to Luminescent for inverse litho technology |
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Apr 12, 2007 at 03:09 PM |
 Luminescent Technologies has said that it has been issued a second of 19 more patents related to its ‘Inverse Lithography Technology' (ILT). The new U.S. patent (No. 7,178,127 B2) covers the use of level-set methods when applied to advanced lithography applications.
"With two patents granted and another 19 pending, our breakthrough technology enjoys a strong IP position," said Luminescent CEO, David Fried. "Our ILT products continue to out-perform the capabilities of state-of-the-art OPC, consistently producing better pattern fidelity and the broadest possible lithography process windows on printed silicon. Customer interest is high and our installed base of ILT products continues to expand."
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