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Clear Shape and Lightspeed Logic team on litho-related variability issues |
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Apr 10, 2007 at 05:27 PM |
 Clear Shape Technologies and Lightspeed Logic plan to jointly develop solutions to reduce lithography and stress-related variability in photomasks specifically for Lightspeed Logic's mask reconfigurable IP at both the 65nm and 45nm nodes.
"Our collaboration allows Lightspeed Logic's innovative technology to have manufacturability ‘built-in' to the reconfigurable logic," said Atul Sharan, President and CEO of Clear Shape. "Clear Shape's DFM tools allow Lightspeed to ensure that as many manufacturability issues as possible are dealt with in their configurable IP, thus dramatically easing the burden of DFM for their customers."
"As we searched for production-proven DFM solutions, we found Clear Shape to be the undisputed technology leader in this field," said Dave Holt, CEO of Lightspeed Logic, Inc. "Clear Shape's endorsement from all the major foundry platforms, semiconductor manufacturers and their OPC-tool independence was extremely important for us."
Lightspeed Logic has developed and marketed five mask-reconfigurable architectures, the most recent being standard tile-based logic array and mutable tile-based logic array offerings for SoC applications.
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