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10th Edition: Compositional Metrology™, A New Tool for Yield Enhancement |
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Feb 03, 2005 at 04:57 PM |
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KENTON D. CHILDS, STEPHEN P. CLOUGH & DENNIS F. PAUL, Physical Electronics, Eden Prairie, MN, USA ABSTRACT
One
of the major challenges for yield enhancement is the ability to
accurately identify defects or particles; optical and SEM methods are
insufficient. Compositional Metrology™, which provides the defect
composition, can furnish the additional information needed. This
technique uses Auger electron spectroscopy for compositional analysis.
Results of the application of the technique to several defects are
described.
Article coming soon.
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