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Home arrow Wafer Processing arrow Articles arrow Edition 10 arrow 10th Edition: In-Situ Metrology in a Modern Fab or Foundry ...
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10th Edition: In-Situ Metrology in a Modern Fab or Foundry – The Inevitable Solution Print E-mail
Feb 03, 2005 at 04:53 PM

MICHAEL J. DENT, Spectra International, Morgan Hill, CA, USA

ABSTRACT

The inexorable march toward wide scale use of insitu sensor control loops is already taking place. The rocketing cost of manufacturing mistakes in a modern production fab or foundry combined with larger wafers, and smaller line geometries, demands in-situ sensor measurement and control, in real time. The outdated reputation of poor reliability and applicability of these techniques is being replaced by a rapidly growing and more widespread sensor use, in many cases product is not made unless the in-situ sensors are reading "go"!

OEM's driven by the improved tool availability, and end users seeking yield improvement, are overcoming the generation old concern that insitu control is a theoretical concept and they are installing complete systems.
icon In-Situ Metrology in a Modern Fab or Foundry - The Inevitable Solution

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