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Doubling up for more than twice the EUV output |
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Mar 13, 2007 at 10:01 AM |
 Powerlase and its research partner, the University of Central Florida, have combined two lasers to create a laser produced plasma (LPP) extreme ultraviolet (EUV) light source. Further research is planned to develop this EUV litho (EUVL) approach into a workable solution for high volume manufacture of semiconductor chips by 2009.
Powerlase develops nanosecond Q-switched diode pumped solid state lasers for industrial applications primarily for use in the materials processing and microelectronics markets for flat panel displays, microelectronics, automotive and aerospace sectors. UCF has been developing sources for advanced lithography and x-ray microscopy since 1990.
Powerlase has provided UCF with two of its kilowatt-class Starlase lasers for use as a light source in the development of LPP EUV litho. The two lasers have been combined to increase the power aimed at the EUV target that consists of tin-doped water microdroplets. EUV power generated at the target has been increased to 23W. This compares with only 10W achieved with one laser. The researchers ultimately aim to have more than 110W of power at the intermediate focus of EUV litho systems.
The multi-laser approach has the major benefit of increasing the power scalability of the LPP EUV approach. EUV lithography is one of the most promising technologies for producing semiconductors at the 32nm and below technology nodes.
The partners say that is the first time more than one laser has been used in EUVL light source generation. In addition, the conversion efficiency of the laser light into 13.5nm wavelength EUV light from both lasers is similar to when they are used independently of each other. This demonstrates the capacity to add more lasers to the process without lowering the conversion efficiency - a vital element in making EUV a viable high volume solution.
Professor Martin Richardson, trustee chair and Northrop-Grumman professor of X-ray Photonics at UCF, reports improvements not only in total output power, but also in power conversion efficiency. "A direct scale-up of our current system will permit a five-fold increase in power, with additional lasers," he says.
Powerlase also works with other institutions across the globe: a project with University College Dublin is examining ion-emissions at the EUV source and a research partnership with the Extreme Ultraviolet Lithography Association (EUVA) in Japan is providing lasers and technical expertise to further develop the EUVL approach.
By Dr Mike Cooke
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