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New Product: Improved optical path enables 45nm mask metrology on the Vistec LMS IPRO4 |
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Mar 12, 2007 at 11:52 AM |
 Product Briefing Outline: Vistec Semiconductor Systems has launched its next generation mask metrology tool, Vistec LMS IPRO4. This new high-end device is designed to support mask metrology for the 45nm technology node and beyond. The new system is a fully automated mask metrology system, capable to measure registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and in reflected light. Several purchase orders for LMS IPRO4 systems have already been placed by the most advanced captive mask shops in Europe and the US.
Problem: Compared to the previous tool generation, the new system provides an enhanced measurement performance with a typical long-term repeatability of better than 1.6nm. An improved optical path, as well as the redesigned stage drive system, enables higher positioning accuracy, according to the company.
Solution: The design of the LMS IPRO4 combines improved throughput with minimum programming time and operator interference. All measurement jobs can easily be prepared and learned on- or offline. A unique data evaluation software package DEVA remains an integral part of Vistec Semiconductor Systems` LMS IPRO metrology solution. It automates the statistical analysis of the gathered data and allows the user to define data evaluation macros. Due to its networking capability, operators and engineers can remotely operate the system and evaluate the results.
Applications: Mask metrology for measuring registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and in reflected light.
Platform: The LMS IPRO series has more than 60 systems installed in the field.
Availability: March 2007 onwards.
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Product Briefings 
