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Nikon ships 45nm immersion litho system |
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Feb 28, 2007 at 04:24 PM |
 Nikon Corporation claims shipment of the world's first immersion lithography system capable of 45nm production. The NSR-S610C, an ArF immersion scanner with a projection lens numerical aperture (NA) of 1.30, shipped to a major IC manufacturer. Nikon claims the NA value is the highest in the industry.
The system is targeted for mass production of 45nm devices and can also
be used for development of 32nm devices and double patterning. Nikon
says the NSR-S610C was selected over the competition because of its
early market introduction and proven ability to print immersion
exposures with no immersion-induced defects and overlay equivalent or
better than dry systems.
Nikon has proprietary "Local Fill Technology" to eliminate scanner-induced immersion defects with no bubbles, water spots, or backside wafer contamination along with eliminating evaporation of the immersion fluid. A tandem stage uses two stages with different functions to increase throughput, improve accuracy, and enhance long-term stability.
Kazuo Ushida, president of Nikon Precision Equipment, reports: "In January [2006], we shipped the world's first production immersion system, the NSR-S609B. Throughout the year, we achieved wins at several accounts by demonstrating our immersion leadership through evaluations and direct comparisons with our competitor's tool. And, after a one-year, head-to-head evaluation in a customer fab, we secured the immersion business at a major IC manufacturer. The shipment of the NSR-S610C further cements our leadership in immersion technology."
By Dr Mike Cooke
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Lithography 
