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Nikon to receive first XLR 500i light source from Cymer |
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Feb 27, 2007 at 09:19 AM |
 Nikon is to receive the first of Cymer's most advanced excimer laser light source - the XLR 500i - that is designed for immersion lithography applications at the 45nm node.
"Last quarter, we celebrated our longstanding partnership with Cymer on the occasion of their 1,000th excimer laser shipment," said Mr. Kazuo Ushida, president of the Nikon Precision Equipment Company, Nikon Corporation. "Nikon is pleased to be the first recipient of the XLR 500i light source. We look forward to integrating this laser into our leading-edge NSR-S610C immersion tool."
"This milestone shipment illustrates Cymer's continued commitment to push the limits of DUV lithography in order to advance the production of chips that power the electronic devices we rely on each day," said Ed Brown, Cymer's president and chief operating officer. "As immersion lithography is deployed into 45nm full production environments, we look forward to providing our customers with laser light sources that enable improved critical dimension control and manageable operating costs."
The XLR system uses Recirculating Ring Technology that enables improved pulse energy stability, lowering the running costs and improving yields.
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