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11th Edition: Overview of Cost of Ownership for Optical Lithography at the 100nm & 70nm Generations |
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Jan 03, 2000 at 03:40 PM |
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Ed Muzio*, Phil Seidel, Gil Shelden & John Canning, International SEMATECH, Inc., Austin, TX, USA, *Intel Corporation Assignee ABSTRACT
The cost of ownership (CoO) has become a key parameter in the comparison of lithography technologies. This article presents some results from the CoO modelling technique used by International SEMATECH, with specific focus on cost drivers and sensitivities. The principal drivers of the CoO values are mask usage, mask cost, tool throughput, and tool cost. By examining trends in these and other areas, one can identify the areas of highest leverage for proactive cost reduction efforts.
11th Edition: An Overview of Cost of Ownership for Optical Lithography at the 100 nm and 70 nm Generations
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Lithography 
