Reproduced by permission of The Electrochemical Society, Inc.

Laurie Beu & Paul Thomas Brown, Motorola, Austin, TX, USA

ABSTRACT

Fluorinated compounds (FCs) are essential to the semiconductor manufacturing process for plasma chamber cleaning and plasma etching. Because FCs have extremely long atmospheric lifetimes and are strong infrared absorbers, efforts have been undertaken to identify methods to reduce atmospheric emissions.This paper will provide an overview of FC emissions reduction technologies including effectiveness and cost to implement. The factors affecting establishment of long term FC emissions reduction goals will be discussed and several goal strategies and their impact on long-term emissions will be analysed.