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TEL and ASML team on immersion lithography optimization |
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Dec 07, 2006 at 10:52 AM |
 Tokyo Electron Limited (TEL) and ASML Holding NV plan to work more closely together in what the companies describe as a ‘long-term joint development program' that is designed to optimize both the lithography and track tools for improved performance for R&D and high-volume production for 45nm and future technology node processes.
Starting in early 2007, the partners will install a CLEAN TRACK LITHIUS coater/developer (pictured) at ASML's R&D facility in Holland and will pair to an advanced TWINSCAN XT:1900i immersion lithography tool for defect reduction work and throughput optimization to reach 180 wafers per hour or more!
"Technological innovation has made the collaborative efforts between exposure equipment manufacturers and coater/developer manufacturers essential for achieving success in our industry. I am confident that the long-term joint development system with ASML in advanced technology will enable us to meet our customers' future requirements," remarked Hikaru Ito, TEL CLEAN TRACK Business Unit General Manager.
"Current lithography technologies such as immersion and double patterning require greater synergy between scanner and track systems than ever before," said Martin van den Brink, EVP Marketing and Technology, ASML.
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