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Applied Materials' UVision SP captures 30nm immersion litho defects |
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Dec 05, 2006 at 02:19 PM |
 Work being carried out at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany's Albany NanoTech complex on next generation immersion lithography processes have claimed a breakthrough in capturing 30nm sized defects, such as micro-bridges between dense lines, using Applied Materials' UVision SP brightfield inspection system.
"The comprehensive detection results provided by the Applied UVision SP system allowed full characterization and optimization of the immersion lithography process," said Dr. James G. Ryan, professor of nanoscience and associate vice president of technology at CNSE. "The knowledge gained from defectivity trends and root cause studies will be extremely beneficial in advancing the cutting-edge research and development being conducted at CNSE's Albany NanoTech complex by faculty, scientists and our growing complement of global corporate partners."
Variable laser polarization is used on the UVision's platform that is claimed to improve sensitivity in finding small defects on complex backgrounds.
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