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New Product: Tokyo Electron boosts photoresist track system productivity with ‘LITHIUS Pro’ |
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Nov 29, 2006 at 07:00 PM |
 Product Briefing Outline: Tokyo Electron Limited (TEL) will release its new 300mm high productivity coater/developer, ‘CLEAN TRACKT' ‘LITHIUS Pro,' in the fall of 2007. The platform will be intended primarily for immersion lithography applications intended for high volume production environments. The system has been designed to offer dramatically higher productivity and reliability, according to the company.
Problem: With the adoption of immersion lithography at the 45nm node, emphasis is now being placed on improved throughput and process capabilities of the coaters/developers to ensure direct compatibility with volume production immersion lithography tool wafer throughputs. Increased demands on process control and extra steps to handle the unique challenges of immersion lithography while containing operating costs are required. Solution: Using integrated metrology tools, CLEAN TRACK LITHIUS Pro will immediately detect abnormal conditions and process changes in order to ensure optimal productivity. In keeping with TEL's commitment to the environment, the CLEAN TRACK LITHIUS Pro will also feature improved CoO (Cost-of-Ownership) by reducing utility usage and chemical consumption. Applications: 45nm and below photoresist processes. Platform: The new system incorporates TEL's CLEAN TRACK ACT technology and CLEAN TRACK LITHIUS series technology. It also includes its proprietary ‘Ingenio' GL, CD Optimizer, and immersion process modules. Other key attributes include high throughput with a more compact footprint, as well as improved equipment maintainability and reliability. Availability: Fall 2007 onwards. 
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Product Briefings 
