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Home arrow News arrow Lithography arrow UMC teams with DFM start-up Clear Shape on hot-spot design issues
UMC teams with DFM start-up Clear Shape on hot-spot design issues Print E-mail
Nov 27, 2006 at 06:02 PM
ImageA new DFM start-up - Clear Shape Technologies, Inc - has come out of stealth mode, highlighting that it has been collaborating with UMC's parametric hotspot detection and repair as part of design flow to handle process variability on advanced process nodes.

The company has two core products in its portfolio: ‘InShape', which is claimed to be a fast full-chip design manufacturability checker, and ‘OutPerform' for full-chip parametric variation analysis and optimization. These products are expected to be made available to UMC's customers later this year, according to Clear Shape.

"Clear Shape's InShape design manufacturability checker, along with its OutPerform electrical DFM analysis and optimization product, are welcome additions to our comprehensive DFM yield optimization offerings that now target 65nm designs," said Patrick Lin, chief SoC architect, system & architecture support at UMC. "We are collaborating with best-in-class DFM providers to deliver standard-cell libraries, SPICE models and design flows to provide users with yield-enhancing knowledge throughout the design and manufacturing stages."

"Clear Shape and UMC have been working closely together to address the uncertainties introduced by systematic variability on IC design," said Atul Sharan, president and CEO of Clear Shape. "It is our privilege to work with UMC to develop a closed-loop electrical DFM solution where fabless semiconductor companies can predict and address potential parametric and yield issues through access to UMC's manufacturing information in a fast, accurate model-based format."

Clear Shape is backed USVP, Intel Capital and KT Ventures - the investment arm of KLA Tencor.


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