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Tool Order: Cymer installs 3000th excimer laser at Toshiba |
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Nov 03, 2006 at 12:09 PM |
 Cymer, the dominant DUV light source manufacturer for lithography systems, has reached a new milestone with the installation of its 3000th excimer laser light source.
The light source, an XLA 300 argon fluoride (ArF) system that is
designed to operate with dedicated immersion lithography tools, was
installed at a major Japanese memory chip manufacturer's 300mm
production facility. The facility is believed to be Toshiba for 55nm
NAND Flash production at Fab 3 in Yokkaichi, Japan, according to market
researcher sources.
"Worldwide, memory chip revenue is estimated to grow 20 percent by the end of 2006, furthering the demand for technology to support volume-production semiconductor manufacturing," said Ed Brown, Cymer's president and chief operating officer. "This latest installation milestone is a testament to our growing installed base, and our leading role in the manufacture of memory chips. We are pleased that our proven low-risk platform continues to be the laser light source of choice for top chipmakers around the globe."
The XLA 300 is the fourth generation light source on Cymer's Master Oscillator Power Amplifier (MOPA) platform.
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Lithography 
