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12th Edition: Enhanced Targets Can Reduce Metallisation Cost of Ownership – A Case Study |
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Feb 03, 2005 at 01:56 PM |
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THOMAS MEIDLINGER, Micronas GmbH, Freiburg, Germany
DANIEL R. MARX, Praxair MRC*, Orangeburg, NY, USA
JEAN-PIERRE BLANCHET, MRC SA, Toulouse, France ABSTRACT
Enhancements
to existing target designs developed by Praxair MRC are shown to
generate significant reductions in cost of ownership in the PVD
sputtering process. Tests at Micronas GmbH illustrate how a
ring-enhanced aluminium alloy target provides a productivity gain both
through increased erosion efficiency and through a 33% extension in
target life while maintaining excellent uniformity. A 65% lifetime
extension provided by recess-enhanced titanium targets provides a route
to a reduction in Ti target consumption by 40%. The film quality met
all requirements throughout the target lives.
 Enhanced Targets Can Reduce Metallisation Cost of Ownership
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Wafer Processing 
