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BOC Edwards and Aviza Technology partner on ALD precursors |
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Oct 30, 2006 at 05:05 PM |
 BOC Edwards and Aviza Technology have entered into a Joint Development Agreement (JDA) to develop Atomic Layer Deposition (ALD) dissolved liquid and gaseous precursors for advanced semiconductor manufacturing applications.
"We are excited about this opportunity to work with Aviza, a leader in the ALD market, to develop innovative ALD solutions for next generation manufacturing processes," said Atul Athalye, Director of Technology, Electronic Materials, at BOC Edwards. "The ultimate beneficiaries of our combined efforts will be our customers, as we aim to provide them with optimized process technology that will achieve reduced cost and higher yields."
"Strategic partnerships with established technology leaders in the semiconductor supply chain is an integral part of Aviza's advanced application activities," said Helmuth Treichel, Vice President, Advanced Applications of Aviza Technology, Inc. "This partnership with BOC Edwards will support our advanced ALD film development efforts to offer a diverse set of films for multiple IC applications. We believe the combination of BOC Edwards' Flex-ALD™ precursors and our ALD hardware technology expertise will deliver to global IC makers added capability to incorporate in their advanced manufacturing."
The JDA will use BOC Edwards' new line of ‘Flex-ALD' precursors, which use dissolved solid precursors in selected solvents to improve deposition rates and reduce material costs for the deposition of HF02 and AL2O3 high-k dielectrics as well as heavier metals such as Ruthenium, used for barrier layers. BOC Edwards claims that its new line of precursors provide increased precursor utilization, stability and consistent delivery without decomposition or condensation, while increasing growth rates for higher throughput. The precursors will be fully evaluated as part of the JDA with Aviza before full commercial release.
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Materials & Gases 
