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12th Edition: SiC Applications for Semiconductor Manufacturing |
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Feb 03, 2005 at 12:05 PM |
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SATOSHI KAWAMOTO & FUMITOMO KAWAHARA, ADMAP Inc., Tamano, Okayama, Japan
TROY COLLARD, Mitsui Zosen USA Inc., San Mateo, CA,USA ABSTRACT
Silicon
carbide is already an indispensable material for current semiconductor
manufacturing. We manufacture silicon carbide coated products and
"free-standing" products using a CVD method. Silicon carbide has some
amazing features: high oxidation resistance, high corrosion resistance
and low diffusion coefficient against many elements, etc. In addition,
"free-standing" products have more advanced characteristics.
We can
manufacture thin and complicated shapes made completely of silicon
carbide without any substrate, and it is very useful for several
processes. Especially, silicon carbide dummy wafers can be used for a
much longer period than silicon dummy wafers for Lp- CVD processes like
doped poly-Si and SiN deposition processes without maintenance. We
conclude that the semiconductor manufacturing process will be improved
and achieve significant cost reduction and a clean environment in each
process by using silicon carbide.
 SiC Applications for Semiconductor Manufacturing
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Wafer Processing 