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Nikon and Brion team on 45nm computational lithography solutions |
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Oct 10, 2006 at 02:24 PM |
 Following on from a spate of ‘litho-friendly' DFM partnerships, Nikon Corporation and Brion Technologies are to work together on improving computational lithography for the 45nm node.
"By partnering with Brion, a leading-edge computational lithography company, we can provide enhanced imaging performance for our customers," stated Toshikazu Umatate, Executive Officer, Precision Equipment Company, Nikon Corporation. "The accuracy of OPC models can be significantly improved and mask qualification time reduced by incorporating our unique tool characteristics into the computational lithography solution."
To achieve acceptable yields, new simulation and modeling programs are required that force design and manufacturing to work closer together, while relying on diminishing depth of focus from optical lithography tools and compensating for such things as immersion effects, polarization impacts, global and local flare and wavefront aberrations.
"We are very excited to work with a world leader such as Nikon," said Tadahiro Takigawa, corporate executive for business and technology development at Brion. "Combining the leading-edge immersion and polarization information from Nikon and the market-leading computational lithography products from Brion enables unprecedented OPC accuracy, which is key to superior total lithography performance. Through this collaboration, we are building a design-for-manufacturing network with our partners and customers."
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Lithography 
